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dc.contributor.authorMelngailis, Johnen_US
dc.contributor.authorMusil, Christian R.en_US
dc.contributor.authorLezec, Henri J.en_US
dc.contributor.authorEtchin, Sergeyen_US
dc.contributor.authorMahoney, Leonard J.en_US
dc.contributor.authorChu, Alexen_US
dc.contributor.authorAntoniadis, Dimitri A.en_US
dc.contributor.authorHaynes, Tony E.en_US
dc.contributor.authorVignaud, Dominiqueen_US
dc.contributor.authorKazior, Thomas E.en_US
dc.contributor.authorCobb, M. H.en_US
dc.contributor.authorArmstrong, Mark A.en_US
dc.contributor.authorChiang, Tony P.en_US
dc.contributor.authorDella Ratta, Anthony D.en_US
dc.contributor.authorThompson, Carl V.en_US
dc.contributor.authorXu, Xinen_US
dc.contributor.authorSosonkina, Janeen_US
dc.date.accessioned2010-07-16T05:18:05Z
dc.date.available2010-07-16T05:18:05Z
dc.date.issued1992-01-01 to 1992-12-31en_US
dc.identifierRLE_PR_135_01_01s_04en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/57228
dc.descriptionContains an introduction, reports on x research projects and a list of publications.en_US
dc.description.sponsorshipDefense Advanced Research Projects Agency/U.S. Army Research Office Grant DAAL-03-92-G-0217en_US
dc.description.sponsorshipNational Science Foundation Grant ECS 89-21728en_US
dc.description.sponsorshipDefense Advanced Research Projects Agency/U.S. Army Research Office (ASSERT Program) Grant DAAL03-92-G-0305en_US
dc.description.sponsorshipSemiconductor Research Corporationen_US
dc.description.sponsorshipNational Science Foundation Grant DMR 92-02633en_US
dc.description.sponsorshipU.S. Army Research Office Grant DAAL03-90-G-0223en_US
dc.description.sponsorshipU.S. Navy - Naval Research Laboratory/Micrion Contract M08774en_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1992en_US
dc.relation.ispartofSolid State Physics, Electronics and Opticsen_US
dc.relation.ispartofMaterials and Fabricationen_US
dc.relation.ispartofFocused Ion Beam Microfabricationen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 135en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherFocused Ion Beam Microfabricationen_US
dc.subject.otherTunable Gunn Diodesen_US
dc.subject.otherOptimization for Microwave Applicationsen_US
dc.subject.otherDose Rate Effects in the Implantation of Si in GaAsen_US
dc.subject.otherLimited Lateral Straggle of Focused-Ion-Beam Implantsen_US
dc.subject.otherFocused Ion Beam Implantation in GaAs for Transistor Optimizationen_US
dc.subject.otherConfined Carrier Distributions in III-V Semiconductors Created by Focused Ion Beamsen_US
dc.subject.otherFocused Ion Beam Lithography for X-ray Mask Makingen_US
dc.subject.otherFocused Ion Beam Induced Deposition of Copperen_US
dc.subject.otherFocused Ion Beam Induced Deposition as a Function of Angle of Ion Incidenceen_US
dc.subject.otherIon Milling as a Function of Angle of Ion Incidenceen_US
dc.titleFocused Ion Beam Microfabricationen_US
dc.typeTechnical Reporten_US


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