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dc.contributor.authorHui, Xia
dc.contributor.authorLu, Li
dc.contributor.authorCeder, Gerbrand
dc.date.accessioned2004-12-09T23:56:29Z
dc.date.available2004-12-09T23:56:29Z
dc.date.issued2005-01
dc.identifier.urihttp://hdl.handle.net/1721.1/7364
dc.description.abstractLiCoO₂thin films have been grown by pulsed laser deposition on stainless steel and SiO₂/Si substrates. The film deposited at 600°C in an oxygen partial pressure of 100mTorr shows an excellent crystallinity, stoichiometry and no impurity phase present. Microstructure and surface morphology of thin films were examined using a scanning electron microscope. The electrochemical properties of the thin films were studied with cyclic voltammetry and galvanostatic charge-discharge techniques in the potential range 3.0-4.2 V. The initial discharge capacity of the LiCoO2 thin films deposited on the stainless steel and SiO₂/Si substrates reached 23 and 27 µAh/cm², respectively.en
dc.description.sponsorshipSingapore-MIT Alliance (SMA)en
dc.format.extent328820 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoen
dc.relation.ispartofseriesAdvanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subjectLiCoO2en
dc.subjectPulsed laser depositionen
dc.subjectThin filmsen
dc.subjectElectrochemical propertiesen
dc.subjectSiO2/Sien
dc.titleGrowth and Characterization of LiCoO₂ Thin Films for Microbatteriesen
dc.title.alternativeGrowth and Characterization of LiCoO2 Thin Films for Microbatteriesen
dc.typeArticleen


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