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dc.contributor.authorRyu, Jeongchun
dc.contributor.authorKajale, Shivam N.
dc.contributor.authorSarkar, Deblina
dc.date.accessioned2024-11-18T15:56:59Z
dc.date.available2024-11-18T15:56:59Z
dc.date.issued2024-11-11
dc.identifier.urihttps://hdl.handle.net/1721.1/157557
dc.description.abstractSpintronics, leveraging electron spin for information processing, promises substantial advancements in energy-efficient computing. Van der Waals (vdW) magnetic materials, with their unique-layered structures and exceptional magnetic properties, have emerged as pivotal components in this field. This report explores the current-based control of vdW magnets, focusing on the spin–orbit torque (SOT) mechanism, which is crucial for spintronic applications. Key studies on Fe3GaTe2/Pt and Fe3GaTe2/WTe2 heterostructures are highlighted, demonstrating efficient SOT switching at room temperature. The advantages of vdW magnets for SOT switching, including high spin-torque efficiencies and superior interface quality, are discussed. The report also examines future directions, such as wafer-scale growth techniques, materials design for enhanced Curie temperatures (Tc), and the development of magneto tunnel junctions using all-vdW materials. These advancements underscore the potential of vdW magnetic materials in developing scalable, high-performance spintronic devices, paving the way for significant breakthroughs in energy-efficient computing. Graphical abstracten_US
dc.publisherSpringer International Publishingen_US
dc.relation.isversionofhttps://doi.org/10.1557/s43579-024-00673-xen_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceSpringer International Publishingen_US
dc.titleVan der Waals magnetic materials for current-induced control toward spintronic applicationsen_US
dc.typeArticleen_US
dc.identifier.citationRyu, J., Kajale, S.N. & Sarkar, D. Van der Waals magnetic materials for current-induced control toward spintronic applications. MRS Communications (2024).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Media Laboratoryen_US
dc.relation.journalMRS Communicationsen_US
dc.identifier.mitlicensePUBLISHER_CC
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2024-11-17T04:24:24Z
dc.language.rfc3066en
dc.rights.holderThe Author(s)
dspace.embargo.termsN
dspace.date.submission2024-11-17T04:24:24Z
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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