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dc.contributor.authorDeshmukh, Akshay
dc.contributor.authorElimelech, Menachem
dc.contributor.authorLienhard, John H.
dc.date.accessioned2025-12-15T16:23:29Z
dc.date.available2025-12-15T16:23:29Z
dc.date.issued2025-11-15
dc.identifier.issn1385-8947
dc.identifier.urihttps://hdl.handle.net/1721.1/164321
dc.description.abstractNew membrane chemistries and structures have rapidly developed over the last ten years, driven by applications ranging from critical metals separations and carbon capture to highly chlorine-resistant reverse-osmosis membranes. The thin selective layer at the heart of reverse osmosis and nanofiltration membranes is typically fabricated using interfacial synthesis, with multifunctional aqueous-phase monomers and organicphase monomers. Here, we develop a physics-based model of partition, diffusion, and reaction dynamics during the early stages of interfacial synthesis. These processes critically impact membrane structure and performance. By solving the resulting partial differential equations numerically and with analytical approximations, we demonstrate that the planar reaction rate is initially limited by the partitioning and diffusion of the aqueous-phase reactant into the organic phase. Later, finite reactant availability and aqueous-phase diffusion become limiting. Through a combination of nondimensionalization, parameter mapping, and property prediction, we develop a framework that spans a wide parameter space in reactant chemistry, solvent and support layer choice, and initial reactant concentrations. We demonstrate that the planar reaction rate and dynamics are strongly affected by the partition coefficient of the aqueous reactant, which varies rapidly with changes in reactant and solvent chemistry. The influence of diffusion variations is more limited. This tractable, physics-based model enables the rapid quantification of monomer and solvent impact on interfacial synthesis, which is essential for the rational development of new high-performance thin-film composite membranes.en_US
dc.description.sponsorshipMIT Energy Initiative (AD)en_US
dc.publisherElsevier BVen_US
dc.relation.isversionof10.1016/j.cej.2025.169670en_US
dc.rightsCreative Commons Attribution-Noncommercial-ShareAlikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceAuthoren_US
dc.titlePartition–diffusion–reaction bounds for thin-film membrane formation kineticsen_US
dc.typeArticleen_US
dc.identifier.citationDeshmukh, Akshay, Elimelech, Menachem and Lienhard, John H. 2025. "Partition–diffusion–reaction bounds for thin-film membrane formation kinetics." Chemical Engineering Journal, 524.
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.relation.journalChemical Engineering Journalen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.date.submission2025-12-15T14:56:40Z
mit.journal.volume524en_US
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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