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dc.contributor.authorLi, Sylvia Xin
dc.contributor.authorIchihara, Takeo
dc.contributor.authorPark, Hyoju
dc.contributor.authorHe, Guangwei
dc.contributor.authorKozawa, Daichi
dc.contributor.authorWen, Yi
dc.contributor.authorKoman, Volodymyr B
dc.contributor.authorZeng, Yuwen
dc.contributor.authorKuehne, Matthias
dc.contributor.authorYuan, Zhe
dc.contributor.authorFaucher, Samuel
dc.contributor.authorWarner, Jamie H
dc.contributor.authorStrano, Michael S
dc.date.accessioned2026-01-30T21:26:43Z
dc.date.available2026-01-30T21:26:43Z
dc.date.issued2023-03-06
dc.identifier.urihttps://hdl.handle.net/1721.1/164682
dc.description.abstractSingle-photon emitters are crucial building blocks for optical quantum technologies. Hexagonal boron nitride (hBN) is a promising two-dimensional material that hosts bright, room-temperature single-photon emitters. However, photo instability is a persistent challenge preventing practical applications of these properties. Here, we reveal the ubiquitous photobleaching of hBN vacancy emitters. Independent of the source or the number of hBN layers, we find that the photobleaching of a common emission at 1.98 ± 0.05 eV can be described by two consistent time constants, namely a first bleaching lifetime of 5 to 10 s, and a second bleaching lifetime in the range of 150 to 220 s. Only the former is environmentally sensitive and can be significantly mitigated by shielding O<jats:sub>2</jats:sub>, whereas the latter could be the result of carbon-assisted defect migration. Annular dark-field scanning transmission electron microscopy of photobleached hBN allows for visualizing vacancy defects and carbon substitution at single atom resolution, supporting the migration mechanism along with X-ray photoelectron spectroscopy. Thermal annealing at 850 °C of liquid exfoliated hBN eliminates both bleaching processes, leading to persistent photostability. These results represent a significant advance to potentially engineer hBN vacancy emitters with the photostability requisite for quantum applications.en_US
dc.language.isoen
dc.publisherSpringer Science and Business Media LLCen_US
dc.relation.isversionof10.1038/s43246-023-00345-8en_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceSpringer Natureen_US
dc.titleProlonged photostability in hexagonal boron nitride quantum emittersen_US
dc.typeArticleen_US
dc.identifier.citationLi, S.X., Ichihara, T., Park, H. et al. Prolonged photostability in hexagonal boron nitride quantum emitters. Commun Mater 4, 19 (2023).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineeringen_US
dc.relation.journalCommunications Materialsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2026-01-30T20:03:27Z
dspace.orderedauthorsLi, SX; Ichihara, T; Park, H; He, G; Kozawa, D; Wen, Y; Koman, VB; Zeng, Y; Kuehne, M; Yuan, Z; Faucher, S; Warner, JH; Strano, MSen_US
dspace.date.submission2026-01-30T20:03:29Z
mit.journal.volume4en_US
mit.journal.issue1en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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