Advanced Materials for Micro- and Nano-Systems (AMMNS): Recent submissions
Now showing items 25-27 of 122
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Oblique Angle Deposition of Germanium Film on Silicon Substrate
(2005-01)The effect of flux angle, substrate temperature and deposition rate on obliquely deposited germanium (Ge) films has been investigated. By carrying out deposition with the vapor flux inclined at 87° to the substrate normal ... -
Nanocrystalline Ge Flash Memories: Electrical Characterization and Trap Engineering
(2005-01)Conventional floating gate non-volatile memories (NVMs) present critical issues for device scalability beyond the sub-90 nm node, such as gate length and tunnel oxide thickness reduction. Nanocrystalline germanium (nc-Ge) ... -
High Optical Quality Nanoporous GaN Prepared by Photoelectrochemical Etching
(2005-01)Nanoporous GaN films are prepared by UV assisted electrochemical etching using HF solution as an electrolyte. To assess the optical quality and morphology of these nanoporous films, micro-photoluminescence (PL), micro-Raman ...


